• DocumentCode
    769104
  • Title

    Perpendicular Magnetic Anisotropy in Amorphous TbCo Sputtered Films

  • Author

    Shimanuki, S. ; Ichihara, K. ; Yasuda, N. ; Ito, K. ; Kon, K.

  • Author_Institution
    Toshiba R and D Center
  • Volume
    2
  • Issue
    4
  • fYear
    1987
  • fDate
    4/1/1987 12:00:00 AM
  • Firstpage
    338
  • Lastpage
    339
  • Abstract
    Effects of sputtering conditions on perpendicular magnetic anisotropy in amorphous TbCo films prepared by two target magnetron cosputtering have been studied. The perpendicular magnetic anisotropy of amorphous TbCo films depended strongly on negative substrate bias voltage and Ar gas pressure. TbCo films deposited at zero substrate bias voltage and low Ar gas pressure (2 ~ 5 mtorr) showed a positive uniaxial magnetic anisotropy (Ku) of 3 ~ 4 × 106 erg/cm3 in the range of 13 ~ 31 at% Tb.
  • Keywords
    Amorphous magnetic materials; Amorphous materials; Argon; Magnetic anisotropy; Magnetic films; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Sputtering; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1987.4549432
  • Filename
    4549432
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=769104