• DocumentCode
    769129
  • Title

    Influence of Sputtering Conditions on Perpendicular Magnetic Anisotropy in GdTbCo Amorphous Films

  • Author

    Tsutsumi, K. ; Fujii, Y. ; Hashima, K. ; Kurokawa, H. ; Sugahara, H.

  • Author_Institution
    Materials and Electronic Devices Lab., Mitsubishi Electric Corp.
  • Volume
    2
  • Issue
    4
  • fYear
    1987
  • fDate
    4/1/1987 12:00:00 AM
  • Firstpage
    344
  • Lastpage
    345
  • Abstract
    The effects of Ar pressure on GdTbCo film characteristics without bias voltage were studied. Sample films demonstrated a large perpendicular anisotropy (Ku) which increased with the Tb contraction. In GdCo films, Ku became less negative as the Ar pressure increased, but Ku decreased in films containing Tb. Other results indicated that GdTbCo disks will be easy to manufacture.
  • Keywords
    Amorphous materials; Anisotropic magnetoresistance; Argon; Helium; Magnetic films; Manufacturing; Perpendicular magnetic anisotropy; Sputtering; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1987.4549435
  • Filename
    4549435
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=769129