Design and fabrication of ridge waveguide folded-cavity in-plane surface-emitting lasers

Author

Chao, Chih-Ping ; Law, Kwok-Keung ; Merz, James L.

Author_Institution

Dept. of Electr. & Comput. Eng., Calfornia Univ., Santa Barbara, CA, USA

Volume

4

Issue

3

fYear

1992

fDate

3/1/1992 12:00:00 AM

Firstpage

223

Lastpage

227

Abstract

A 45 degrees angled reactive ion etching combined with an in situ monitoring technique was used to fabricate ridge waveguide folded-cavity in-plane surface-emitting lasers. This laser structure, with two 45 degrees C angle-etched internal total-reflection mirrors and an epitaxially grown distributed Bragg reflector, is very promising for OEIC applications. Laser-structure design and laser fabrication are addressed. A continuous-wave threshold current of 8 mA, the lowest reported in the literature, was achieved on 3- mu m-wide, 350- mu m long devices.<>

Keywords

distributed Bragg reflector lasers; laser accessories; laser cavity resonators; mirrors; molecular beam epitaxial growth; optical waveguides; optical workshop techniques; semiconductor growth; semiconductor junction lasers; semiconductor technology; sputter etching; 3 micron; 350 micron; 8 mA; CW threshold current; OEIC applications; angle-etched internal total-reflection mirrors; angled reactive ion etching; diode lasers; epitaxially grown distributed Bragg reflector; folded-cavity; in situ monitoring technique; in-plane surface-emitting lasers; laser fabrication; laser structure; laser structure design; ridge waveguide; Distributed Bragg reflectors; Etching; Laser applications; Mirrors; Monitoring; Optical device fabrication; Optoelectronic devices; Surface emitting lasers; Surface waves; Waveguide lasers;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.122373

Filename

122373