DocumentCode :
769711
Title :
Substrate Bias Voltage Effect on Properties of TbCo Amorphous Films
Author :
Gondoh, Y. ; Mihara, M. ; Suezawa, Y.
Author_Institution :
Yokohama National Univ., Faculty of Engineering, Yokohama.
Volume :
2
Issue :
5
fYear :
1987
fDate :
5/1/1987 12:00:00 AM
Firstpage :
463
Lastpage :
464
Abstract :
The effect of substrate voltage on TbCo amorphous films is discussed. Changes in the saturation magnetization (Ms) and perpendicular magnetic anisotropy constant (Ku) were measured while varying the substrate bias voltage (Vb). The substrates were coated with Cr, which stabilized the bias voltage between target and substrate resulting in the reproducible film properties. Without Cr coating, Ms did not vary in a consistent manner, and most films tested had perpendicular and in-plane components. Varying electric potential and sputtering electrical discharge may have caused this inconsistency.
Keywords :
Amorphous materials; Chromium; Coatings; Electric potential; Magnetic films; Perpendicular magnetic anisotropy; Saturation magnetization; Substrates; Testing; Voltage;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1987.4549491
Filename :
4549491
Link To Document :
بازگشت