• DocumentCode
    769721
  • Title

    Effects of Ar-ion Implantation Into Ni Thin Films

  • Author

    Gondoh, Y. ; Yamagata, K. ; Suezawa, Y.

  • Author_Institution
    Yokohama National Univ. Faculty of Engineering, Yokohama.
  • Volume
    2
  • Issue
    5
  • fYear
    1987
  • fDate
    5/1/1987 12:00:00 AM
  • Firstpage
    465
  • Lastpage
    466
  • Abstract
    The effect of implanting Ar+ ions into Ni films (as opposed to Fe films) on magnetic moment is discussed. The magnetic moment decreased gradually at doses of 1 × 1015 ions/cm2 or less and decreased suddenly beyond 3 × 1016 ions/cm2. These doses eventually reduce surface tension. Higher doses convert this internal stress back into surface tension. These results support the model that the formation of Ar bubbles generates new Ni interfaces and that this formation of interfaces decreases the Ni magnetic moment.
  • Keywords
    Amorphous materials; Argon; Chemical elements; Internal stresses; Iron; Magnetic films; Magnetic moments; Surface tension; Temperature; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1987.4549492
  • Filename
    4549492
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=769721