DocumentCode
77037
Title
A Short-Channel Common Double-Gate MOSFET Model Adapted to Gate Oxide Thickness Asymmetry
Author
Sharan, Neha ; Mahapatra, Santanu
Author_Institution
Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
Volume
61
Issue
8
fYear
2014
fDate
Aug. 2014
Firstpage
2732
Lastpage
2737
Abstract
Existing compact models for common double-gate (CDG) MOSFETs are based on the fundamental assumption of having symmetric gate oxide thickness. In this paper, we demonstrate that using the unique quasi-linear relationship between the surface potentials, it is possible to develop compact model for CDG-MOSFETs without such approximation while preserving the mathematical complexity at the same level of the existing models. In the proposed model, the surface potential relationship is used to include the drain-induced barrier lowering, channel length modulation, velocity saturation, and quantum mechanical effect in the long-channel model and good agreement is observed with the technology computer aided design simulation results.
Keywords
MOSFET; computational complexity; technology CAD (electronics); CDG-MOSFET; channel length modulation; drain-induced barrier lowering; gate oxide thickness asymmetry; long-channel model; mathematical complexity; quantum mechanical effect; quasi-linear relationship; short-channel common double-gate MOSFET model; surface potentials; technology computer aided design simulation; velocity saturation; Electric potential; Logic gates; MOSFET; Mathematical model; Semiconductor device modeling; Silicon; Threshold voltage; Compact modeling; MOSFET; MOSFET.; double gate (DG);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2014.2331191
Filename
6847203
Link To Document