DocumentCode :
77037
Title :
A Short-Channel Common Double-Gate MOSFET Model Adapted to Gate Oxide Thickness Asymmetry
Author :
Sharan, Neha ; Mahapatra, Santanu
Author_Institution :
Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
Volume :
61
Issue :
8
fYear :
2014
fDate :
Aug. 2014
Firstpage :
2732
Lastpage :
2737
Abstract :
Existing compact models for common double-gate (CDG) MOSFETs are based on the fundamental assumption of having symmetric gate oxide thickness. In this paper, we demonstrate that using the unique quasi-linear relationship between the surface potentials, it is possible to develop compact model for CDG-MOSFETs without such approximation while preserving the mathematical complexity at the same level of the existing models. In the proposed model, the surface potential relationship is used to include the drain-induced barrier lowering, channel length modulation, velocity saturation, and quantum mechanical effect in the long-channel model and good agreement is observed with the technology computer aided design simulation results.
Keywords :
MOSFET; computational complexity; technology CAD (electronics); CDG-MOSFET; channel length modulation; drain-induced barrier lowering; gate oxide thickness asymmetry; long-channel model; mathematical complexity; quantum mechanical effect; quasi-linear relationship; short-channel common double-gate MOSFET model; surface potentials; technology computer aided design simulation; velocity saturation; Electric potential; Logic gates; MOSFET; Mathematical model; Semiconductor device modeling; Silicon; Threshold voltage; Compact modeling; MOSFET; MOSFET.; double gate (DG);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2331191
Filename :
6847203
Link To Document :
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