• DocumentCode
    77037
  • Title

    A Short-Channel Common Double-Gate MOSFET Model Adapted to Gate Oxide Thickness Asymmetry

  • Author

    Sharan, Neha ; Mahapatra, Santanu

  • Author_Institution
    Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
  • Volume
    61
  • Issue
    8
  • fYear
    2014
  • fDate
    Aug. 2014
  • Firstpage
    2732
  • Lastpage
    2737
  • Abstract
    Existing compact models for common double-gate (CDG) MOSFETs are based on the fundamental assumption of having symmetric gate oxide thickness. In this paper, we demonstrate that using the unique quasi-linear relationship between the surface potentials, it is possible to develop compact model for CDG-MOSFETs without such approximation while preserving the mathematical complexity at the same level of the existing models. In the proposed model, the surface potential relationship is used to include the drain-induced barrier lowering, channel length modulation, velocity saturation, and quantum mechanical effect in the long-channel model and good agreement is observed with the technology computer aided design simulation results.
  • Keywords
    MOSFET; computational complexity; technology CAD (electronics); CDG-MOSFET; channel length modulation; drain-induced barrier lowering; gate oxide thickness asymmetry; long-channel model; mathematical complexity; quantum mechanical effect; quasi-linear relationship; short-channel common double-gate MOSFET model; surface potentials; technology computer aided design simulation; velocity saturation; Electric potential; Logic gates; MOSFET; Mathematical model; Semiconductor device modeling; Silicon; Threshold voltage; Compact modeling; MOSFET; MOSFET.; double gate (DG);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2014.2331191
  • Filename
    6847203