Preparation of Garnet Films for Hybrid Head by RF-Sputtering

Garnet films have the low saturation flux density characteristics required for use in the ring head gap sections of hybrid heads. Conditions for preparation of garnet films by the RF sputter technique were studied. Oxygen density, annealing time, and power supplied were the most important film formation factors, while target material composition was also significant, with a critical level of 5 percent. It was found that annealing from 950°C for 30 min after film growth under 50 W applied power in an argon atmosphere including 2 percent oxygen produced the best garnet film with characteristics close to those of bulk material.