Magnetization Properties of CoCr Sputtered Films on Polyimide Substrates

CoCr films were formed by sputtering on polyimide substrate at room temperature and at 190°C, and the effects of a substrate bias voltage VB and a focusing magnetic field Ha were investigated. Of films formed at room temperature, the anisotropy field Hk, perpendicular anisotropy energy Ku and X-ray diffracted intensity were maximum at a substrate bias voltage of ¿50 V, and the coercivity and ¿¿50 were minimum. A small negative bias was found to improve the film c-axis orientation. A Bitter pattern from such a film sample is also shown.