DocumentCode
772316
Title
An explicit expression for surface potential at high-end of moderate inversion
Author
Shigyo, Naoyuki
Author_Institution
Syst. LSI Design Div., Toshiba Corp. Semicond. Co., Kawasaki, Japan
Volume
49
Issue
7
fYear
2002
fDate
7/1/2002 12:00:00 AM
Firstpage
1265
Lastpage
1273
Abstract
There is a moderate inversion region between the weak and strong inversion regions of MOSFET operation. This region is very important for designing analog circuits. This paper presents a new explicit expression for the surface potential at the high-end of the moderate inversion, which is useful for a circuit modeling. This expression allows a new definition for the threshold voltage Vth and a model of the relation between off-current Ioff and on-current Ion of MOSFETs. A source resistance Rs has large influence on Ion, so that a model for Rs was newly developed. Proposed models for Vth and Ioff-Ion characteristics were compared with experiments. It is found that the new definition Of Vth could apply to both short- and long-channel MOSFETs. The model revealed different Ioff-Ion behaviors between high and low halo dose MOSFETs
Keywords
MOSFET; inversion layers; ion implantation; semiconductor device models; surface potential; Fermi potential; MOSFET operation; analog circuit design; capacitance ratio; circuit model; explicit expression; halo dose; long-channel MOSFET; moderate inversion high-end; off-current on-current relation; short-channel MOSFET; source resistance; subthreshold current; surface potential; threshold voltage; Analog circuits; Capacitance; Circuit simulation; Digital circuits; MOSFET circuits; Predictive models; Region 1; Surface resistance; Threshold voltage; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2002.1013285
Filename
1013285
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