• DocumentCode
    772362
  • Title

    CHISEL flash EEPROM. I. Performance and scaling

  • Author

    Mahapatra, Souvik ; Shukuri, S. ; Bude, Jeff

  • Author_Institution
    Agere Syst., Murray Hill, NJ, USA
  • Volume
    49
  • Issue
    7
  • fYear
    2002
  • fDate
    7/1/2002 12:00:00 AM
  • Firstpage
    1296
  • Lastpage
    1301
  • Abstract
    In this work, we demonstrate the feasibility of using channel initiated secondary electron (CHISEL) programming in high-density flash memories containing fully scaled memory cells. We discuss programming performance, cell channel length scaling, endurance, and reliability of single cells and large arrays. We show successful CHISEL programming operation in fully scaled flash cells having channel lengths down to 0.22 μm. Compared to conventional channel hot electron (CHE) programming, CHISEL operation shows faster programming for identical drain bias, and lower power consumption for similar programming speed. The effect of channel length scaling on CHISEL operation and related device optimization is discussed using measurements and device simulation. Measurement on optimized floating gate contacted devices having channel length down to 0.14 μm show good programming efficiency under CHISEL operation
  • Keywords
    CMOS memory circuits; Monte Carlo methods; PLD programming; flash memories; hot carriers; impact ionisation; integrated circuit modelling; integrated circuit reliability; CHISEL flash EEPROM; Monte Carlo simulator; cell channel length scaling; channel initiated secondary electron programming; device optimization; device simulation; endurance; fully scaled memory cells; high-density flash memories; hot holes; impact ionization; large arrays; optimized floating gate contacted devices; programming performance; reliability; single cells; Channel hot electron injection; Charge carrier processes; EPROM; Hot carriers; Impact ionization; Integrated circuit technology; Length measurement; MOSFET circuits; Microelectronics; Substrate hot electron injection;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2002.1013289
  • Filename
    1013289