DocumentCode :
772654
Title :
Base-transit-time model considering field dependent mobility for BJTs operating at high-level injection
Author :
Hassan, M. M Shahidul ; Nomani, Md Waliullah Khan
Author_Institution :
Dept. of Electr. & Electron. Eng., Bangladesh Univ. of Eng. & Technol., Dhaka
Volume :
53
Issue :
10
fYear :
2006
Firstpage :
2532
Lastpage :
2539
Abstract :
An analytical model for the base transit time taub for an exponentially doped base is developed assuming a small change in electron concentration in the base of a bipolar junction transistor at high injection from its low injection value. The model is valid in all levels of injection before the onset of the Kirk effect. In this analysis, bandgap-narrowing effect, high-injection effect, and carrier velocity saturation at the base edge of the base-collector junction, and also doping and field dependence of mobility, are incorporated. The base transit time calculated analytically is compared with simulation and numerical results, and also with experimental data in order to demonstrate the validity of the assumptions made in deriving the expression. The base transit time is found to be different if the field dependent mobility is considered
Keywords :
bipolar transistors; carrier density; carrier mobility; charge injection; semiconductor device models; semiconductor doping; surface diffusion; BJT; Kirk effect; bandgap-narrowing effect; base-transit-time model; bipolar junction transistor; field dependent mobility; high injection; high-level injection; semiconductor doping; Analytical models; Bipolar transistors; Current density; Doping; Electron mobility; Integral equations; Iterative methods; Kirk field collapse effect; Numerical simulation; Semiconductor process modeling; Base transit time; bipolar junction transistors (BJTs); high injection;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.882269
Filename :
1705105
Link To Document :
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