DocumentCode :
772777
Title :
Radiation Damage in Lithium Drifted p-i-n Junctions
Author :
Coleman, J.A. ; Rodgers, J.W.
Author_Institution :
Bell Telephone Laboratories, Incorporated Murray Hill, New Jersey
Volume :
11
Issue :
3
fYear :
1964
fDate :
6/1/1964 12:00:00 AM
Firstpage :
213
Lastpage :
220
Abstract :
A major effect of radiation damage of semiconductor junction detectors is the decrease of charge carrier lifetime. The thick depletion regions and low fields usually employed in p-i-n junctions makes them particularly sensitive to radiation damage. A study of the changes of electron trapping lengths in silicon p-i-n junctions as a function of radiation damage by Co60 gamma rays is presented. Significant changes of collection efficiency and collection time were observed at doses (~105R) which are considered negligible for damage in p-n junctions. The variations of reverse current and noise were small for these low doses. A method of fabrication and encapsulation of p-i-n junction radiation detectors is described which utilizes ion drifting from a localized source of lithium and a gold-silicon alloy seal.
Keywords :
Charge carrier lifetime; Electron traps; Fabrication; Gamma rays; Lithium; P-n junctions; PIN photodiodes; Semiconductor counters; Semiconductor device noise; Silicon;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1964.4323425
Filename :
4323425
Link To Document :
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