Title :
Degradation of floating-gate memory reliability by few electron phenomena
Author :
Molas, Gabriel ; Deleruyelle, Damien ; De Salvo, Barbara ; Ghibaudo, Gérard ; Gély, Marc ; Perniola, Luca ; Lafond, Dominique ; Deleonibus, Simon
Author_Institution :
CEA-Lab. of Electron., Technol., & Instrum., Grenoble
Abstract :
The purpose of this paper is to give a quantitative evaluation of the intrinsic reliability limits of floating-gate (FG) memories in the decananometer range due to the reduction of collective phenomena and to the dominance of single-electron stochastic behaviors. To this end, first, a model that quantitatively predicts the intrinsic dispersions of the memory retention time and programming window is proposed. Second, experimental results obtained on ultrascaled memory devices (with an active area as small as 30 nm times 30 nm) with either a continuous poly-Si FG or silicon nanocrystals will be shown and used to validate this model. Finally, extrapolations on the intrinsic reliability limits of future generations of Flash memories will be done
Keywords :
electron beam lithography; flash memories; silicon-on-insulator; single electron devices; 30 nm; collective phenomena reduction; electron phenomena; electron-beam lithography; flash memories; floating-gate memories; floating-gate memory reliability; intrinsic reliability limits; memory retention time; polysilicon nanocrystals; programming window; quantitative evaluation; quantum dots; silicon-on-insulator technology; single-electron stochastic behaviors; ultrascaled memory devices; Analytical models; Degradation; Electrons; Flash memory; Instruments; Nanocrystals; Nonvolatile memory; Predictive models; Silicon on insulator technology; Stochastic processes; Electron-beam (e-beam) lithography; memories; quantum dots; silicon-on-insulator (SOI) technology;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2006.882284