• DocumentCode
    772859
  • Title

    8-band k.p theory of the material gain of strained tetrahedral semiconductors: application to 1.3 μm-InGaAsP lasers subject to additional external uniaxial stress

  • Author

    Enders, P. ; Müller, R. ; Klehr, A. ; Gundlach, H.

  • Author_Institution
    Max-Born-Inst. fur Nichtlincare Optik, Berlin, Germany
  • Volume
    143
  • Issue
    1
  • fYear
    1996
  • fDate
    2/1/1996 12:00:00 AM
  • Firstpage
    62
  • Lastpage
    66
  • Abstract
    Numerical and experimental results are presented for bulk 1.3 μm-InGaAsP on InP subject to internal biaxial strain in the xy-plane (active layer, strain axis in growth or z direction) and/or external stress along the lateral, x direction. This uniaxial stress by an external force acting perpendicular to the built-in biaxial strain provides an additional degree of freedom for studying the strain dependence of electron states and, thus, of device properties. The material gain is calculated using a novel method for efficient Brillouin-zone integration. The maximum linear gain is parametrised as g(n)=a(n-nl) for TE- and for TM-polarised light, and the strain dependence of differential gain a and of transparency density n is calculated and discussed in terms of symmetry. The theoretical results compare well with measurements of threshold currents and emission-wavelength differences at TE-TM switching of ridge-waveguide laser diodes
  • Keywords
    III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; k.p calculations; laser beams; ridge waveguides; semiconductor lasers; stress effects; waveguide lasers; 1.3 mum; Brillouin-zone integration; InGaAsP; InGaAsP lasers; InGaAsP-InP; InP; TE-TM switching; TE-polarised light; TM-polarised light; active layer; built-in biaxial strain; degree of freedom; device properties; differential gain; electron states; emission-wavelength differences; external force; external stress; external uniaxial stress; internal biaxial strain; k.p theory; material gain; maximum linear gain; strain axis; strain dependence; strained tetrahedral semiconductors; symmetry; threshold currents; transparency density; uniaxial stress; xy-plane;
  • fLanguage
    English
  • Journal_Title
    Optoelectronics, IEE Proceedings -
  • Publisher
    iet
  • ISSN
    1350-2433
  • Type

    jour

  • DOI
    10.1049/ip-opt:19960141
  • Filename
    487677