• DocumentCode
    772878
  • Title

    Three-dimensional thermal analysis of a flip-chip mounted AlGaN/GaN HFET using confocal micro-Raman spectroscopy

  • Author

    Ji, Hangfeng ; Kuball, Martin ; Sarua, Andrei ; Das, Jo ; Ruythooren, Wouter ; Germain, Marianne ; Borghs, Gustaaf

  • Author_Institution
    H.H. Wills Phys. Lab., Bristol Univ.
  • Volume
    53
  • Issue
    10
  • fYear
    2006
  • Firstpage
    2658
  • Lastpage
    2661
  • Abstract
    The authors demonstrate the potential of confocal micro-Raman spectroscopy to enable three-dimensional (3-D) thermal analysis of solid state devices. This is illustrated on a flip-chip mounted AlGaN/GaN heterostructure field-effect transistor. To better understand its heat dissipation and for device optimization, it is desirable to know temperature distribution not only in the active device area, but also in the bulk substrate. This cannot be achieved using traditional thermal imaging techniques. 3-D thermal imaging was demonstrated by probing the temperature dependent Raman shift of phonons at different depths within the bulk substrate using confocal micro-Raman spectroscopy. The heatsinking through the metal bumps connecting the active device area to the flip-chip carrier is illustrated. Experimental temperature results are in reasonably good agreement with 3-D finite difference simulations
  • Keywords
    III-V semiconductors; Raman spectroscopy; aluminium compounds; cooling; finite difference methods; flip-chip devices; gallium compounds; high electron mobility transistors; infrared imaging; semiconductor device packaging; thermal analysis; wide band gap semiconductors; 3D finite difference simulations; 3D thermal analysis; AlGaN-GaN; HFET; Raman spectroscopy; bulk substrate; device optimization; flip chip; heat dissipation; heatsinking; metal bumps; phonons; solid state devices; temperature distribution; thermal imaging; Aluminum gallium nitride; Gallium nitride; HEMTs; MODFETs; Phonons; Raman scattering; Solid state circuits; Spectroscopy; Temperature dependence; Temperature distribution; Field-effect transistor (FET); Raman spectroscopy; gallium compounds; modeling; temperature measurement; three-dimensional (3-D);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2006.882399
  • Filename
    1705124