Title :
High silica waveguides on alumina substrates for hybrid optoelectronic integration
Author :
Sun, C.J. ; Myers, W.M. ; Schmidt, K.M. ; Sumida, S. ; Jackson, K.P.
Author_Institution :
Photonic Integration Res. Inc., Columbus, OH, USA
fDate :
6/1/1992 12:00:00 AM
Abstract :
High-silica optical waveguides are fabricated on alumina substrates by flame hydrolysis deposition (FHD) and reactive ion etching (RIE) patterning techniques. The composition of the high-silica glass waveguides is adjusted from that of the conventional FHD glass to reduce the thermal expansion mismatch between silica glass and alumina. Glass waveguides made in this way exhibit low loss and are compatible with various types of alumina ceramic substrates.<>
Keywords :
chemical vapour deposition; hybrid integrated circuits; integrated optics; integrated optoelectronics; optical glass; optical losses; optical waveguides; optical workshop techniques; sputter etching; Al/sub 2/O/sub 3/; alumina substrates; ceramic substrates; composition; flame hydrolysis deposition; high silica optical waveguides; hybrid optoelectronic integration; low loss; reactive ion etching; silica glass; thermal expansion mismatch; Electronics packaging; Glass; High speed optical techniques; Optical devices; Optical films; Optical waveguides; Silicon compounds; Substrates; Sun; Thermal stresses;
Journal_Title :
Photonics Technology Letters, IEEE
