• DocumentCode
    773785
  • Title

    Microfabrication techniques and applications

  • Author

    Ciarlo, Dino

  • Author_Institution
    Lawrence Livermore Nat. Lab., CA, USA
  • Volume
    9
  • Issue
    3
  • fYear
    1990
  • Firstpage
    13
  • Lastpage
    16
  • Abstract
    The impact of advances in integrated circuit fabrication techniques on other microtechnologies is examined. The key techniques, photolithography and etching, are discussed. Applications of these techniques to the fabrication of diffraction gratings, thin windows, and photoresist molds for electroplating are described.<>
  • Keywords
    diffraction gratings; electroplating; etching; integrated circuit technology; optical materials; photolithography; diffraction gratings; electroplating; etching; integrated circuit fabrication techniques; microtechnologies; photolithography; photoresist moulds; thin windows; Application specific integrated circuits; Chemical vapor deposition; Electronic components; Fabrication; Integrated circuit technology; Resists; Semiconductor devices; Silicon; Sputter etching; Substrates;
  • fLanguage
    English
  • Journal_Title
    Potentials, IEEE
  • Publisher
    ieee
  • ISSN
    0278-6648
  • Type

    jour

  • DOI
    10.1109/45.101393
  • Filename
    101393
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=773785