DocumentCode
774057
Title
InP-GaInP quantum-dot lasers emitting between 690-750 nm
Author
Smowton, P.M. ; Lutti, J. ; Lewis, G.M. ; Krysa, A.B. ; Roberts, J.S. ; Houston, P.A.
Author_Institution
Sch. of Phys. & Astron., Cardiff Univ., UK
Volume
11
Issue
5
fYear
2005
Firstpage
1035
Lastpage
1040
Abstract
We describe the growth, material characterization, and device characterization of InP-GaInP quantum-dot lasers for operation in the wavelength range 690-750 nm. We show that the growth conditions have a major influence on the form of the gain spectrum. Relatively flat gain can be achieved over a spectral width of 90 nm at 300 K using samples containing a bimodal distribution of dot sizes, or narrower gain spectra at shorter wavelength can be achieved by suppressing the bimodal distribution by using (211)B substrates. Optimization of samples grown on substrates with the growth surface of (100) misorientated by 10° toward [111] results in laser operation between 729 and 741 nm and with a room temperature threshold current density as low as 190 A·cm-2 for a 2000-μm-long device with uncoated facets.
Keywords
III-V semiconductors; gallium compounds; indium compounds; quantum dot lasers; semiconductor growth; spectral line narrowing; (211)B substrates; 2000 mum; 293 to 298 K; 300 K; 690 to 750 nm; InP-GaInP; InP-GaInP lasers; bimodal distribution; device characterization; gain spectrum; material characterization; narrow gain spectra; quantum dot growth; quantum-dot lasers; room temperature; sample optimization; spectral width; threshold current density; Epitaxial growth; Epitaxial layers; Indium phosphide; Optical materials; Quantum dot lasers; Quantum dots; Semiconductor lasers; Substrates; Surface emitting lasers; Threshold current; Quantum dots; semiconductor lasers;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2005.853838
Filename
1564038
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