Title :
Design and fabrication of compact etched diffraction grating demultiplexers based on a-Si nanowire technology
Author :
Song, J. ; Zhu, N.
Author_Institution :
State Key Lab. for Modern Opt. Instrum., Zhejiang Univ., Hangzhou
Abstract :
alpha-silicon nanowire waveguides and related techniques are studied. An ultra-compact etched diffraction grating demultiplexer with 10 nm spacing is fabricated and characterised. The dimension of the device is around half a millimetre, which is one to two orders of magnitude smaller than conventional silica based devices.
Keywords :
demultiplexing equipment; diffraction gratings; nanowires; optical communication equipment; silicon; alpha-silicon nanowire waveguides; compact etched diffraction grating demultiplexers; optical network; wavelength division multiplexing;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20081038
