Title :
Fabrication of Transmission Color Filters Using Silicon Subwavelength Gratings on Quartz Substrates
Author :
Kanamori, Yoshiaki ; Shimono, Masaya ; Hane, Kazuhiro
Author_Institution :
Dept. of Nanomechanics, Tohoku Univ., Sendai
Abstract :
We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 mum-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom beam etching are used. The grating periods are 400, 350, and 440 nm for the red, green, and blue filters, respectively. The transmission spectrum obtained from a coupling between an incident light and the submicrometer periodic grating matches with human color perception. The transmittances of 71.1%, 58.1%, and 59.3% are obtained for the red, green, and blue filters, respectively
Keywords :
colour; diffraction gratings; electron beam lithography; etching; integrated optics; optical fabrication; optical filters; quartz; silicon; 350 nm; 400 nm; 440 nm; Si-SiO2; SiO2; blue filter; displays; electron beam lithography; fast atom etching; green filter; human color perception; multichannel detectors; optical fabrication; quartz substrates; red filter; silicon gratings; submicrometer periodic grating; subwavelength gratings; transmission color filter; transmission spectrum; Atomic beams; Detectors; Displays; Electron beams; Etching; Fabrication; Filters; Gratings; Lithography; Silicon; Micromachining; optical device fabrication; optical filters; optical gratings; periodic structures;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2006.883208
