• DocumentCode
    775266
  • Title

    In situ catalyzation of carbon nanostructures growth in low-frequency inductively coupled plasmas

  • Author

    Long, J.D. ; Xu, S. ; Huang, S.Y. ; Rutkevych, P.P. ; Xu, M. ; Diong, C.H.

  • Author_Institution
    Plasma Sources & Applic. Centre, Nanyang Technol. Univ., Singapore
  • Volume
    33
  • Issue
    2
  • fYear
    2005
  • fDate
    4/1/2005 12:00:00 AM
  • Firstpage
    240
  • Lastpage
    241
  • Abstract
    A low-frequency inductively coupled plasma source has been employed for in situ catalyzed growth of carbon nanostructures. The catalyzing process depends strongly on the plasma parameters and controls the shape and alignment of nanostructures.
  • Keywords
    carbon; catalysis; nanostructured materials; plasma chemistry; plasma materials processing; plasma sources; C; carbon nanostructures; catalyzation; low-frequency inductively coupled plasmas; plasma source; Argon; Carbon dioxide; Nanostructures; Nickel; Plasma applications; Plasma displays; Plasma sources; Plasma temperature; Radio frequency; Sputtering; Carbon nanostructure; in situ catalyzation; inductively coupled plasma;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2005.845340
  • Filename
    1420416
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=775266