DocumentCode
775791
Title
Discharge in dual magnetron sputtering system
Author
Musil, Jindrich ; Baroch, Pavel
Author_Institution
Dept. of Phys., Univ. of West Bohemia, Plzen, Czech Republic
Volume
33
Issue
2
fYear
2005
fDate
4/1/2005 12:00:00 AM
Firstpage
338
Lastpage
339
Abstract
A dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For an efficient deposition process, however, it is very important to optimize the electrical and magnetic field of the magnetron. Images of plasma discharges in different magnetic field configurations of the dual magnetron are presented.
Keywords
high-frequency discharges; plasma confinement; plasma diagnostics; plasma materials processing; sputter deposition; deposition; dual magnetron sputtering system; electric field optimization; insulated thin films; magnetic field optimization; plasma discharges; reactive magnetron sputtering; Cathodes; Delta modulation; Geometry; Magnetic confinement; Magnetic fields; Magnetic switching; Magnets; Mirrors; Plasma confinement; Sputtering; Dual magnetron; magnetic field confinement; plasma discharge;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2005.844996
Filename
1420465
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