DocumentCode
775909
Title
High-Speed (60 GHz) and Low-Voltage-Driving Electroabsorption Modulator Using Two-Consecutive-Steps Selective-Undercut-Wet-Etching Waveguide
Author
Wu, Tsu-Hsiu ; Chiu, Yi-Jen ; Lin, Fang-Zheng
Author_Institution
Inst. of Electro-Opt. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung
Volume
20
Issue
14
fYear
2008
fDate
7/15/2008 12:00:00 AM
Firstpage
1261
Lastpage
1263
Abstract
Based on a novel structure of waveguide, a broadband electroabsorption modulator (EAM) with low driving voltage and high extinction ratio has been demonstrated in this letter. The waveguide of InGaAsP-InP p-i-n layer structure is fabricated by two consecutive steps of selective undercut-wet-etching: 1)HCl : H3PO4 on p-InP (p- layer), and 2)H3PO4 : H2O2 : H2O on InGaAsP (active region), showing a wide ridge with a narrow undercut active region. Low capacitance and low cladding impedance can thus be simultaneously attained in such waveguides, leading to low microwave loss and high-speed electrooptical (EO) response. A ridge as wide as 8 mum with a 3-mum- wide active region and a 450-nm gap height in the undercut portion has been fabricated. A 350- mum -long waveguide of EAM is designed, revealing a high extinction ratio of > 30 dB (D.C.) and a modulation efficiency of > 20 dB/V (D.C.) with polarization-insensitive operation at a wavelength of 1550 nm. As high as 60 GHz of a 3-dB bandwidth is measured in the high-speed EO conversion. Calculations by an equivalent circuit model are quite fitted with the measurement, revealing that broadband performance is mainly attributed to the low microwave propagation loss in such waveguides.
Keywords
III-V semiconductors; electro-optical modulation; electroabsorption; etching; gallium arsenide; gallium compounds; high-speed optical techniques; indium compounds; integrated optics; microwave photonics; optical design techniques; optical fabrication; optical waveguides; ridge waveguides; InGaAsP-InP; broadband EAM design; cladding impedance; driving voltage; equivalent circuit model; extinction ratio; frequency 60 GHz; high-speed electrooptical response; low-voltage-driving electroabsorption modulator; microwave propagation loss; p-i-n layer structure; polarization-insensitive operation; ridge waveguide fabrication; selective-undercut-wet-etching; size 350 mum; wavelength 1550 nm; Bandwidth; Capacitance; Electrooptic modulators; Electrooptical waveguides; Extinction ratio; Impedance; Low voltage; PIN photodiodes; Polarization; Wavelength measurement; Electroabsorption modulator (EAM); high extinction ratio; high-speed; low microwave loss; low-voltage driving; two-step selective undercut etching;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2008.926032
Filename
4553774
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