• DocumentCode
    77691
  • Title

    Study on Switching Characteristics of Reversely Switched Dynistor With an N-Buffer Layer

  • Author

    Lin Liang ; Cheng Liu ; Changdong Chen ; Haiyang Wang ; Qiao Zhang ; Yuehui Yu

  • Author_Institution
    Sch. of Opt. & Electron. Inf., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • Volume
    43
  • Issue
    6
  • fYear
    2015
  • fDate
    Jun-15
  • Firstpage
    2032
  • Lastpage
    2037
  • Abstract
    In this paper, an N-buffer layer has been introduced into the reversely switched dynistor (RSD). The relationship between the buffer layer and the device characteristics, together with the interaction among structural parameters, is discussed by the orthogonal method in detail. Based on the simulation results, buffer thickness Wn-buffer and buffer concentration Nn-buffer, N+ emitter concentration Nn+, and P+ emitter concentration Np+ at anode can all affect the maximum turn-ON voltage UFmax on the RSD. Furthermore, the UFmax increases with increasing Wn-buffer or decreasing Np+, and if Nn-buffer becomes higher continuously, the UFmax slightly decreases first, and then dramatically goes up. Besides, the interaction between Nn-buffer and Wn-buffer has a dramatic impact on the UFmax. When Nn-buffer = 1E17 cm-3, Wn-buffer = 10 μm, Np+ = 1E18 cm-3, and Nn+ = 1E20 cm-3, UFmax reaches its minimum in all the simulations. The experimental results verify the device characteristic´s improvement by introducing the buffer layer.
  • Keywords
    anodes; buffer layers; power semiconductor switches; semiconductor device models; N-buffer layer; RSD; buffer concentration; buffer thickness; emitter concentration; orthogonal method; reversely switched dynistor; switching characteristics; Anodes; Buffer layers; Doping; Mathematical model; Optical switches; Semiconductor process modeling; Buffer layer; maximum turn-ON voltage; orthogonal method; pulsed power switch; reversely switched dynistor (RSD); reversely switched dynistor (RSD).;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2015.2430355
  • Filename
    7112537