DocumentCode :
777580
Title :
Controlled single-electron effects in nonoverlapped ultra-short silicon field effect transistors
Author :
Boeuf, Frédéric ; Jehl, Xavier ; Sanquer, Marc ; Skotnicki, Thomas
Volume :
2
Issue :
3
fYear :
2003
Firstpage :
144
Lastpage :
148
Abstract :
Low temperature transport measurements in ultra-short silicon field effect transistors with deliberately nonoverlapping gates show periodic Coulomb blockade oscillations. Despite its relatively small charging energy (≈2 meV) this single-electron effect is promising because it is controlled by geometrical confinement between the nonoverlapped extensions acting as tunnel barriers. Remarkably these single electron devices are excellent field effect transistors at room temperature.
Keywords :
Coulomb blockade; MOSFET; cryogenic electronics; nanoelectronics; semiconductor quantum dots; single electron transistors; 16 nm; 2 meV; 4.2 K; Si-Si0.75Ge0.25; controlled single-electron effects; cryogenic electronics; deliberately nonoverlapping gates; electrostatically defined quantum dot; geometrical confinement; low temperature transport measurements; nanotechnology; nonoverlapped MOSFET; nonoverlapped ultra-short silicon field effect transistors; periodic Coulomb blockade oscillations; quantum effect semiconductor devices; relatively small charging energy; room temperature; tunnel barriers; Current measurement; FETs; Geometry; Lithography; MOSFETs; Quantum dots; Shape control; Silicon; Temperature measurement; Voltage;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2003.817230
Filename :
1230114
Link To Document :
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