Title :
Electrostatics of coaxial Schottky-barrier nanotube field-effect transistors
Author :
John, D.L. ; Castro, Leonardo C. ; Clifford, Jason ; Pulfrey, David L.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC, Canada
Abstract :
Analytical and numerical methods are used to solve Poisson´s equation for carbon nanotube field-effect transistors (FETs) with a cylindrical surrounding gate and Schottky-barrier contacts to the source and drain. The effect on the nanotube potential profile of varying the work functions of all the electrodes, and the thickness and permittivity of the gate dielectric, is investigated. From these results, the general trends to be expected in the above-threshold drain current-voltage characteristics of Schottky-barrier nanotube FETs are predicted. The unusual possibility of simultaneous electron and hole contributions to the drain current is revealed. The subthreshold characteristics are computed from a solution to Laplace´s equation, and the subthreshold slope is found to depend on gate dielectric thickness in a different manner from that in other FETs.
Keywords :
Poisson equation; Schottky barriers; Schottky gate field effect transistors; carbon nanotubes; dielectric thin films; nanotube devices; semiconductor device models; work function; Laplace equation; Poisson equation; Schottky-barrier contacts; above-threshold drain current-voltage characteristics; analytical methods; carbon nanotube field-effect transistors; coaxial Schottky-barrier nanotube field-effect transistors; cylindrical surrounding gate; drain current; electron contributions; electrostatic analysis; gate dielectric permittivity; gate dielectric thickness; hole contributions; nanotechnology; nanotube potential profile; numerical methods; subthreshold characteristics; subthreshold slope; work functions; CNTFETs; Charge carrier processes; Coaxial components; Current-voltage characteristics; Dielectrics; Electrodes; Electrostatics; FETs; Permittivity; Poisson equations;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2003.817228