• DocumentCode
    777660
  • Title

    Ionizing radiation-induced asymmetries of the retention characteristics of ferroelectric thin films

  • Author

    Moore, R.A. ; Benedetto, J.M.

  • Author_Institution
    Army Res Lab., Adelphi, MD, USA
  • Volume
    42
  • Issue
    6
  • fYear
    1995
  • fDate
    12/1/1995 12:00:00 AM
  • Firstpage
    1575
  • Lastpage
    1584
  • Abstract
    A new failure mode in ferroelectric, non-volatile memories in a radiation environment has been identified. Exposure to ionizing radiation in combination with a series of unipolar pulses, which could be found in a read-only or read-mostly memory application, has been found to create a preferred memory state in the ferroelectric storage cell. This preferred memory state, or imprint, causes a significant asymmetry in the retention of polarization. While ferroelectric materials remain highly radiation tolerant, a new, more stringent testing method-should be adopted for hardness assurance. The creation of a preferential memory state, or `imprint´, in ferroelectric films and memories has previously only been reported in elevated temperature situations
  • Keywords
    failure analysis; ferroelectric storage; ferroelectric thin films; integrated circuit reliability; integrated circuit testing; integrated memory circuits; radiation effects; radiation hardening (electronics); failure mode; ferroelectric storage cell; ferroelectric thin films; hardness assurance; ionizing radiation exposure; ionizing radiation-induced asymmetries; nonvolatile memories; preferred memory state; radiation environment; radiation tolerant memory cell; retention characteristics; testing method; Capacitors; Circuits; Degradation; Ferroelectric films; Ferroelectric materials; Ionizing radiation; Iron; Polarization; Pulse measurements; Transistors;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.488752
  • Filename
    488752