Elastic properties measurement of glass layers fabricated on silicon wafers for microelectronics and micromachines

Elastic properties such as the Young´s modulus, the Poisson´s ratio and the density of Si-B-O glass layers fabricated on [100] silicon substrates by the flame hydrolysis deposition method were measured. Thicknesses of the layers were about 20 /spl mu/m. It was found that the Young´s modulus decreased with the boron dopant concentration. The Poisson´s ratio was about 0.26 regardless of the boron dopant concentration. The measured elastic properties will be used in the design of micromachines fabricated with silicon substrates and glass layers.<>