DocumentCode :
77892
Title :
Physically Based Evaluation of Electron Mobility in Ultrathin-Body Double-Gate Junctionless Transistors
Author :
Kangliang Wei ; Lang Zeng ; Juncheng Wang ; Gang Du ; Xiaoyan Liu
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Volume :
35
Issue :
8
fYear :
2014
fDate :
Aug. 2014
Firstpage :
817
Lastpage :
819
Abstract :
In this letter, we presented theoretical results on the low-field electron mobility of ultrathin-body double-gate junctionless transistors. A 1D Poisson-Schrödinger problem perpendicular to the gate is self-consistently solved to get the electron wavefunctions, and the Kubo-Greenwood formula with consideration of phonon, surface roughness, and ionized impurity scattering is employed to evaluate the corresponding mobility components. The dependence of mobility on silicon layer thickness and doping concentration is also investigated.
Keywords :
MOSFET; Poisson equation; Schrodinger equation; electron mobility; impurity scattering; semiconductor doping; stochastic processes; surface roughness; 1D Poisson-Schrödinger problem; JLT; Kubo-Greenwood formula; MOSFET; doping concentration; electron wavefunction; ionized impurity scattering; low-field electron mobility; phonon; physically based evaluation; surface roughness; ultrathin-body double-gate junctionless transistor; Doping; Impurities; Rough surfaces; Scattering; Silicon; Surface roughness; Transistors; Ionized impurity scattering; junctionless (JL); mobility; screening; surface roughness; ultrathin; ultrathin.;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2331326
Filename :
6847674
Link To Document :
بازگشت