DocumentCode :
780254
Title :
Effect of Poling Voltage on the Room-Temperature Stability of the Second-Order Nonlinearity in Thermally Poled Fused Silica
Author :
An, Honglin ; Fleming, Simon
Author_Institution :
Opt. Fibre Technol. Centre, Univ. of Sydney, Eveleigh, NSW
Volume :
19
Issue :
10
fYear :
2007
fDate :
5/15/2007 12:00:00 AM
Firstpage :
753
Lastpage :
755
Abstract :
The effect of poling voltages on the room-temperature stability of the second-order nonlinearity in thermally poled fused silica was investigated. The nonlinearity induced in samples poled with higher voltages was found to be more stable than that induced with lower poling voltages. A charge recombination process through electrons hopping via transition metal ions has been proposed
Keywords :
electro-optical effects; optical harmonic generation; optical materials; silicon compounds; 293 to 298 K; SiO2; charge recombination; electron hopping; electrooptic effects; fused silica; poling voltage effect; room-temperature stability; sample nonlinearity; second harmonic generation; second-order nonlinearity; thermal poling; transition metal ions; Anodes; Australia; Etching; Glass; Optical fibers; Optical interferometry; Silicon compounds; Temperature; Thermal stability; Voltage; Electrooptic effects; second-harmonic (SH) generation; silica; transition metal-doped materials;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2007.895441
Filename :
4156226
Link To Document :
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