Analytic approximation for charge current and deposition by 0.1 to 100 MeV electrons in thick slabs

An analytic function is developed for approximation of current penetration and charge deposition as a function of depth with normal incidence high energy electrons on slabs. The slabs must be thicker than the electron penetration depth and be composed of one material. Six adjustable parameters are evaluated to fit the function to tabulated ITS monte carlo and experimental electron deposition data. The results were developed from data spanning the entire energy range in C, Al, Cu, Ag, and Au, but are assumed to apply to all atomic number materials at all energies in the range.