• DocumentCode
    780793
  • Title

    Temperature-Dependent Capacitance Characteristics of RF LDMOS Transistors With Different Layout Structures

  • Author

    Hu, Hsin-Hui ; Chen, Kun-Ming ; Huang, Guo-Wei ; Chen, Ming-Yi ; Cheng, Eric ; Yang, Yu-Chi ; Chang, Chun-Yen

  • Author_Institution
    Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu
  • Volume
    29
  • Issue
    7
  • fYear
    2008
  • fDate
    7/1/2008 12:00:00 AM
  • Firstpage
    784
  • Lastpage
    787
  • Abstract
    In this letter, the capacitance characteristics of RF LDMOS transistors with different temperatures and layout structures were studied. In a conventional fishbone structure, the peaks in capacitances decrease with increasing temperature. For the ring structure, two peaks in a capacitance-voltage curve have been observed at high drain voltages due to the additional corner effect. In addition, peaks in gate-to-source/body capacitance decrease and peaks in gate-to-drain capacitance increase with increasing temperature at high drain voltages. By analyzing the effects of temperature on threshold voltage, quasi-saturation current, and drift depletion capacitance, the variations of capacitances with temperature were investigated.
  • Keywords
    MOSFET; capacitance; semiconductor doping; RF LDMOS transistors; capacitance characteristics; capacitance-voltage curve; drift depletion capacitance; fishbone structure; gate-to-drain capacitance; gate-to-source/body capacitance; layout structures; quasi-saturation current; ring structure; threshold voltage; Capacitance; Capacitance-voltage characteristics; Costs; Doping; Fingers; MOSFET circuits; Power amplifiers; Radio frequency; Temperature; Threshold voltage; Capacitance; drift region; laterally diffused MOS (LDMOS); layout structure; nonuniform doping; temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2008.2000648
  • Filename
    4558099