DocumentCode :
780793
Title :
Temperature-Dependent Capacitance Characteristics of RF LDMOS Transistors With Different Layout Structures
Author :
Hu, Hsin-Hui ; Chen, Kun-Ming ; Huang, Guo-Wei ; Chen, Ming-Yi ; Cheng, Eric ; Yang, Yu-Chi ; Chang, Chun-Yen
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu
Volume :
29
Issue :
7
fYear :
2008
fDate :
7/1/2008 12:00:00 AM
Firstpage :
784
Lastpage :
787
Abstract :
In this letter, the capacitance characteristics of RF LDMOS transistors with different temperatures and layout structures were studied. In a conventional fishbone structure, the peaks in capacitances decrease with increasing temperature. For the ring structure, two peaks in a capacitance-voltage curve have been observed at high drain voltages due to the additional corner effect. In addition, peaks in gate-to-source/body capacitance decrease and peaks in gate-to-drain capacitance increase with increasing temperature at high drain voltages. By analyzing the effects of temperature on threshold voltage, quasi-saturation current, and drift depletion capacitance, the variations of capacitances with temperature were investigated.
Keywords :
MOSFET; capacitance; semiconductor doping; RF LDMOS transistors; capacitance characteristics; capacitance-voltage curve; drift depletion capacitance; fishbone structure; gate-to-drain capacitance; gate-to-source/body capacitance; layout structures; quasi-saturation current; ring structure; threshold voltage; Capacitance; Capacitance-voltage characteristics; Costs; Doping; Fingers; MOSFET circuits; Power amplifiers; Radio frequency; Temperature; Threshold voltage; Capacitance; drift region; laterally diffused MOS (LDMOS); layout structure; nonuniform doping; temperature;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2008.2000648
Filename :
4558099
Link To Document :
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