DocumentCode :
782014
Title :
Analysis of the tuning sensitivity of silicon-on-insulator optical ring resonators
Author :
Baehr-Jones, Tom ; Hochberg, Michael ; Walker, Chris ; Chan, Eric ; Koshinz, Dennis ; Krug, William ; Scherer, Axel
Author_Institution :
California Inst. of Technol., Pasadena, CA, USA
Volume :
23
Issue :
12
fYear :
2005
Firstpage :
4215
Lastpage :
4221
Abstract :
High-quality-factor optical ring resonators have recently been fabricated in thin silicon-on-insulator (SOI). Practical applications of such devices will require careful tuning of the precise location of the resonance peaks. In particular, one often wants to maximize the resonance shift due to the presence of an active component and minimize the resonance shift due to temperature changes. This paper presents a semianalytic formalism that allows the prediction of such resonance shifts from the waveguide geometry. This paper also presents the results of experiments that show the tuning behavior of several ring resonators and find that the proposed semianalytic formalism agrees with the observed behavior.
Keywords :
Q-factor; integrated optics; optical resonators; optical waveguide theory; silicon-on-insulator; Si-SiO2; high-quality-factor resonators; optical ring resonators; resonance shift; semianalytic formalism; silicon-on-insulator; tuning sensitivity; waveguide geometry; Geometrical optics; Optical refraction; Optical ring resonators; Optical sensors; Optical tuning; Optical variables control; Optical waveguides; Resonance; Silicon on insulator technology; Waveguide transitions; Integrated optics; integrated optoelectronics; optical waveguide; photothermal effects;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2005.853147
Filename :
1566749
Link To Document :
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