• DocumentCode
    782342
  • Title

    Radiation Hardening of MOS Transistors for Low Ionizing Dose Levels

  • Author

    Barry, A.L. ; Page, D.F.

  • Author_Institution
    Defence Research Telecommuications Establishment Ottawa, Canada
  • Volume
    13
  • Issue
    6
  • fYear
    1966
  • Firstpage
    255
  • Lastpage
    261
  • Abstract
    The effect on MOS field-effect transistors of moderate doses of ionizing radiation (up to a few tens of kilorads) is a lateral shift in the Id-Vgs characteristic. Experimental results are given here to describe this shift, particularly for low ionizing doses, and from these results a model similar to others recently published is given to describe the mechanisms involved. The experiments are based on measurements of "small-dose radiation sensitivity", defined for the MOSFET as the incremental shift of gate threshold voltage with the application of an increment of radiation, i.e. dVT/d??. Detailed observations of dVT/d?? under a variety of conditions of radiation, bias and temperature, lead to a technique for radiation hardening. Using this technique, the radiation sensitivity can be made negligible for doses up to several thousand rads, at the expense of only minor changes in other device parameters.
  • Keywords
    Circuits; FETs; Insulation; Ionizing radiation; Lattices; MOSFETs; Radiation hardening; Thermal resistance; Thermal stability; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1996.4324369
  • Filename
    4324369