DocumentCode
782342
Title
Radiation Hardening of MOS Transistors for Low Ionizing Dose Levels
Author
Barry, A.L. ; Page, D.F.
Author_Institution
Defence Research Telecommuications Establishment Ottawa, Canada
Volume
13
Issue
6
fYear
1966
Firstpage
255
Lastpage
261
Abstract
The effect on MOS field-effect transistors of moderate doses of ionizing radiation (up to a few tens of kilorads) is a lateral shift in the Id-Vgs characteristic. Experimental results are given here to describe this shift, particularly for low ionizing doses, and from these results a model similar to others recently published is given to describe the mechanisms involved. The experiments are based on measurements of "small-dose radiation sensitivity", defined for the MOSFET as the incremental shift of gate threshold voltage with the application of an increment of radiation, i.e. dVT/d??. Detailed observations of dVT/d?? under a variety of conditions of radiation, bias and temperature, lead to a technique for radiation hardening. Using this technique, the radiation sensitivity can be made negligible for doses up to several thousand rads, at the expense of only minor changes in other device parameters.
Keywords
Circuits; FETs; Insulation; Ionizing radiation; Lattices; MOSFETs; Radiation hardening; Thermal resistance; Thermal stability; Threshold voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1996.4324369
Filename
4324369
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