Title :
Correlation of Scattering Loss, Sidewall Roughness and Waveguide Width in Silicon-on-Insulator (SOI) Ridge Waveguides
Author :
Yap, Kuan Pei ; Delâge, André ; Lapointe, Jean ; Lamontagne, Boris ; Schmid, Jens H. ; Waldron, Philip ; Syrett, Barry A. ; Janz, Siegfried
Author_Institution :
Nat. Res. Council of Canada, Ottawa, ON, Canada
Abstract :
We use star couplers to measure the relative scattering losses of silicon-on-insulator (SOI) ridge waveguides of various widths over the range of 1.75 to 0.2 mum in a single measurement. The scattering loss data obtained for waveguides fabricated by different photolithography and e-beam base processes correlate well with the measured root-mean-square roughness of the waveguide sidewalls obtained using SEM image analysis, and are in qualitative agreement with the prediction of simple scattering loss theory.
Keywords :
correlation methods; mean square error methods; optical couplers; optical fabrication; optical loss measurement; photolithography; ridge waveguides; scanning electron microscopy; silicon-on-insulator; SEM image analysis; Si-SiO2; correlation analysis; e-beam base process; optical waveguide fabrication; photolithography; root-mean-square roughness; scattering loss; silicon-on-insulator ridge waveguide; single measurement; star coupler; waveguide sidewall roughness; waveguide width; Scattering loss; sidewall roughness; silicon-on-insulator (SOI) waveguide; star coupler;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2009.2021562
