• DocumentCode
    783958
  • Title

    Fabrication, characterization and index profile modeling of high-damage resistance Zn-diffused waveguides in congruent and MgO:lithium niobate

  • Author

    Young, W.M. ; Fejer, M.M. ; Digonnet, M.J.F. ; Marshall, A.F. ; Feigelson, R.S.

  • Author_Institution
    Stanford Univ., CA, USA
  • Volume
    10
  • Issue
    9
  • fYear
    1992
  • fDate
    9/1/1992 12:00:00 AM
  • Firstpage
    1238
  • Lastpage
    1246
  • Abstract
    A study of the fabrication and optical properties of planar waveguides fabricated in MgO:LiNbO3 and LiNbO3 substrates by diffusion of a ZnO film is presented. Transmission electron microscopy was used to show that using ZnO instead of metallic zinc as a source, and maintaining the ZnO film thickness below a prescribed value, greatly reduces second phase precipitation and produces usable waveguides. Dopant and refractive index profiles were characterized by electron microprobe analysis and interference microscopy, respectively. The dependence of the Zn diffusion coefficient on temperature and the dependence of the refractive-index change on Zn concentration are inferred from these measurements. A simple model is also reported which predicts the index profile of the waveguide given the film thickness, diffusion time and temperature. The validity of the model is demonstrated by comparison between calculated profiles and profiles measured by prism coupling and IWKB analysis
  • Keywords
    diffusion in solids; doping profiles; electron probe analysis; integrated optics; lithium compounds; magnesium compounds; optical microscopy; optical waveguides; optical workshop techniques; refractive index; transmission electron microscope examination of materials; zinc; IWKB analysis; LiNbO3 substrates; LiNbO3:MgO,Zn; LiNbO3:Zn; TEM; ZnO film diffusion; ZnO film thickness; diffusion coefficient; dopant profiles; electron microprobe analysis; fabrication; high-damage resistance Zn-diffused waveguides; index profile modeling; interference microscopy; optical properties; planar waveguides; prism coupling; refractive index profiles; temperature dependence; transmission electron microscopy; Electron optics; Optical device fabrication; Optical films; Optical planar waveguides; Optical refraction; Optical variables control; Optical waveguides; Planar waveguides; Substrates; Zinc oxide;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/50.156875
  • Filename
    156875