Title :
Room-temperature operation of patterned quantum-dot lasers fabricated by electron beam lithography and selective area metal-organic chemical vapor deposition
Author :
Elarde, V.C. ; Rangarajan, R. ; Borchardt, J.J. ; Coleman, J.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana-Champaign, IL, USA
fDate :
5/1/2005 12:00:00 AM
Abstract :
We have developed a quantum-dot fabrication process which allows for explicit definition of the location and lateral dimension of quantum dots using electron beam lithography and selective area metal-organic chemical vapor deposition. We have demonstrated the first reported room-temperature operation of a patterned quantum-dot edge-emitting laser based on this fabrication technique.
Keywords :
MOCVD; electron beam lithography; quantum dot lasers; semiconductor epitaxial layers; 20 degC; edge-emitting laser; electron beam lithography; patterned quantum dot lasers; quantum-dot fabrication; room temperature operation; room-temperature operation; selective area epitaxy; selective area metal-organic chemical vapor deposition; Chemical vapor deposition; Electron beams; Electron optics; Epitaxial growth; Gallium arsenide; Lithography; MOCVD; Optical device fabrication; Quantum dot lasers; Quantum dots; Electron beam lithography; metal–organic chemical vapor deposition (MOCVD); patterned quantum dot; quantum-dot laser; selective area epitaxy;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.844555
