• DocumentCode
    7845
  • Title

    Liquid Phase Deposition Based {\\rm SnO}_{2} Gas Sensor Integrated With TaN Heater on a Micro-Hotplate

  • Author

    Jin-Chern Chiou ; Shang-Wei Tsai ; Chia-Yang Lin

  • Author_Institution
    Dept. of Electr. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • Volume
    13
  • Issue
    6
  • fYear
    2013
  • fDate
    Jun-13
  • Firstpage
    2466
  • Lastpage
    2473
  • Abstract
    A micromachined liquid-phase deposition (LPD)-based SnO2 gas sensor that is integrated with a tantalum nitride (TaN) microheater on micro-hotplate is designed and fabricated using microelectromechanical systems technology. TaN is available in many traditional complementary metal oxide semiconductor designs, unlike many other microheater materials. For the initial time, TaN is used in semiconductor metal oxide gas sensor as a heater. The thermal response, thermal distribution, and power consumption of the TaN microheater are measured using a thermal imaging camera. The operating temperature of TaN micro-hotplate can exceed 500°C and they have a favorable thermal distribution within the sensing area. The temperature variation over the sensing area for a TaN microheater with a size of 300×300 μm is ~ 4% at 500°C. Its power consumption is successfully decreased by adopting a structure with ratio of edge length of the membrane to that of the microheater of 2.5. The sensing responses of the LPD-based SnO2 gas sensor with the TaN microheater to H2S gas are measured at various operating temperatures. The optimal operating temperature of the designed gas sensors is in the range 250°C -300°C. The designed sensing film with an area of 100×100 μm has greater sensitivity to a staircase concentration of H2S gas than those with the other two areas (200×200 μm and 300×300 μm).
  • Keywords
    CMOS integrated circuits; cameras; gas sensors; infrared imaging; micromachining; microsensors; tantalum compounds; tin compounds; LPD-based gas sensor; SnO2; TaN; complementary metal oxide semiconductor designs; liquid phase deposition; microelectromechanical system technology; microheater materials; microhotplate; micromachined liquid-phase deposition-based gas sensor; power consumption; semiconductor metal oxide gas sensor; tantalum nitride microheater; temperature 250 degC to 300 degC; temperature 500 degC; thermal distribution; thermal imaging camera; thermal response; Gas sensor; MEMS; liquid phase deposition; micro-heater; micro-hotplate; tin oxide;
  • fLanguage
    English
  • Journal_Title
    Sensors Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1530-437X
  • Type

    jour

  • DOI
    10.1109/JSEN.2013.2256780
  • Filename
    6494260