Vertical-cavity surface-emitting lasers fabricated by vacuum integrated processing

Author

Choquette, Kent D. ; Hasnain, G. ; Mannaerts, J.P. ; Wynn, J.D. ; Wetzel, R.C. ; Hong, M. ; Freund, R.S. ; Leibenguth, R.E.

Author_Institution

AT&T Bell Lab., Murray Hill, NJ, USA

Volume

4

Issue

9

fYear

1992

Firstpage

951

Lastpage

954

Abstract

The authors report on the fabrication of vertical-cavity surface-emitting lasers (VCSELs) using vacuum processing techniques. The upper monolithic distributed Bragg reflector around the laser cavity is dry etched down to the top of the active region, followed by in situ contact deposition on the mesa sidewall, providing a short current path through the p-type mirror. These etched VCSELs exhibit lower series resistance, lower threshold voltage, greater thermal dissipation, and higher maximum output power than conventional planar VCSELs made from the same material.<>

Keywords

laser accessories; laser cavity resonators; mirrors; optical workshop techniques; semiconductor lasers; vacuum deposition; active region; diode laser fabrication; dry etched; higher maximum output power; in situ contact deposition; laser cavity; lower series resistance; lower threshold voltage; mesa sidewall; p-type mirror; short current path; thermal dissipation; upper monolithic distributed Bragg reflector; vacuum integrated processing; vertical-cavity surface-emitting lasers; Distributed Bragg reflectors; Dry etching; Mirrors; Optical device fabrication; Power generation; Surface emitting lasers; Thermal resistance; Threshold voltage; Vacuum technology; Vertical cavity surface emitting lasers;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.157112

Filename

157112