DocumentCode :
785653
Title :
Fabrication of low-loss optical-quality polymer waveguide facets in multilayer polymer devices using an inductively coupled plasma
Author :
Diffey, William M. ; Trimm, Rebecca H. ; Temmen, Mark G. ; Ashley, Paul R.
Author_Institution :
U.S. Army Res., Dev., & Eng. Command, Weapons Sci. Directorate, Arsenal, AL, USA
Volume :
23
Issue :
4
fYear :
2005
fDate :
4/1/2005 12:00:00 AM
Firstpage :
1787
Lastpage :
1790
Abstract :
A systematic study of the etching of multilayer polymer stacks using an inductively coupled plasma (ICP) has been performed. The optimized parameters were used to etch smooth vertical features in a three-layer polymer device, which are suitable for use as low-loss waveguide facets. Waveguide facets of sufficient optical quality to allow the direct coupling of the output from an actively aligned super luminescent diode (SLD) with a coupling efficiency of 40% have been demonstrated. The ability to fabricate optical-quality waveguide facets through a dry etching process, rather than mechanical means such as dicing, can enable the production of compact highly integrated optical devices.
Keywords :
optical fabrication; optical multilayers; optical polymers; optical waveguides; plasma materials processing; sputter etching; ICP; dry etching; inductively coupled plasma; multilayer polymer devices; polymer waveguide facet fabrication; Etching; Nonhomogeneous media; Optical coupling; Optical device fabrication; Optical devices; Optical polymers; Optical waveguides; Plasma applications; Plasma devices; Plasma waves; Inductively coupled plasma (ICP); optical waveguides; plasma materials-processing applications; polyimides;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2005.843839
Filename :
1424156
Link To Document :
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