Title :
Design, fabrication, and testing of an electrohydrodynamic ion-drag micropump
Author :
Darabi, Jeff ; Rada, Mihai ; Ohadi, Michael ; Lawler, John
Author_Institution :
Dept. of Mech. Eng., South Carolina Univ., Columbia, SC, USA
fDate :
12/1/2002 12:00:00 AM
Abstract :
This paper presents the design, fabrication, and testing of a novel electrohydrodynamic (EHD) ion-drag micropump. In order to maximize the electrical field gradients that are responsible for EHD pumping, we incorporated three-dimensional (3-D) triangular bumps of solder as part of the EHD electrodes. To form these bumps, Niobium was sputter-deposited onto a ceramic substrate, coated with photoresist, optically exposed and etched using a reactive ion etcher to define the electrode pattern. The substrate was then "dipped" into a molten solder pool. Since the solder adheres only to the metallic film, bumps of solder form on the electrodes, giving the electrodes a significant 3-D character. The overall dimensions of the micropump are 19 mm × 32 mm × 1.05 mm. Four different designs were fabricated and tested. Static pressure tests were performed with a 3M Thermal Fluid (HFE-7100) as the working fluid and the optimum design was identified. The results with the thermal fluid were highly promising and indicated a pumping head of up to 700 Pa at an applied voltage of 300 V. The experimental results for the four different designs show that the presence of the 3-D bump structures significantly improves the pumping performance. Also, a much better pumping performance was obtained with the micropump in which the emitter had a saw-tooth shape.
Keywords :
electrohydrodynamics; micropumps; 300 V; 3M Thermal Fluid HFE-7100; 700 Pa; EHD electrode; Nb; ceramic substrate; electrical field gradient; electrohydrodynamic ion-drag micropump; metallic film; photoresist coating; reactive ion etching; soldering; sputter-deposited niobium; three-dimensional triangular bump; Electrodes; Electrohydrodynamics; Fabrication; Micropumps; Niobium; Optical films; Pumps; Sputter etching; Substrates; Testing;
Journal_Title :
Microelectromechanical Systems, Journal of
DOI :
10.1109/JMEMS.2002.805046