DocumentCode :
786905
Title :
Radiation Induced Peaking Effect in Open Geometry P-Channel Mosfets
Author :
Newman, Phillip A. ; Wannemacher, Harry E.
Author_Institution :
NASA Goddard Space Flight Center Greenbelt, Maryland 20771
Volume :
14
Issue :
6
fYear :
1967
Firstpage :
299
Lastpage :
302
Abstract :
A shift in the gate threshold voltage of 7 to 9 times its initial value after irradiation with 2 to 6 x 1012 electrons/cm2 of 1.5 Mev electrons is observed for a p-channel enhancement type MOSFET. The effect has only been observed at gate biases greater than -20 V.
Keywords :
Current measurement; Data acquisition; Electrons; Geometry; Insulation; Ionizing radiation; MOSFETs; NASA; Registers; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1967.4324810
Filename :
4324810
Link To Document :
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