• DocumentCode
    788224
  • Title

    The structure and magnetic properties of sputtered, amorphous CoFeSiB thin films

  • Author

    Banerjee, R. ; Choe, G. ; Cho, Byung-II ; Walser, R.M.

  • Author_Institution
    I/UCR Center for Magnetics, Texas Univ., Austin, TX, USA
  • Volume
    31
  • Issue
    6
  • fYear
    1995
  • fDate
    11/1/1995 12:00:00 AM
  • Firstpage
    3856
  • Lastpage
    3858
  • Abstract
    Amorphous wires and ribbons of composition Co70.5Fe4.5Si15B10 have a very small magnetostriction and very low coercivities for wall motion. Their high permeabilities are of considerable technological interest. Thin films of these alloys might be useful for applications, but had not been previously studied. This work studied the structural and magnetic properties of amorphous thin films sputtered from an alloy target with the composition Co70.5Fe4.5Si15B10 . The results obtained show that the coercivity and in-plane anisotropy of the sputtered films are much larger than those of ribbons and wires. Attempts to reduce these parameters by varying the processing and annealing parameters, substrate material, composition, and film thickness were largely unsuccessful. While these results are not understood, the composite data suggests that the higher values may be due to micro-compositional inhomogeneities resulting from higher effective quench rates of sputtering
  • Keywords
    amorphous magnetic materials; boron alloys; cobalt alloys; coercive force; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic permeability; magnetic thin films; magnetostriction; silicon alloys; sputtered coatings; Co70.5Fe4.5Si15B10; anisotropy; annealing; coercivity; magnetic properties; magnetostriction; micro-compositional inhomogeneities; permeability; sputtered amorphous CoFeSiB thin films; structure; wall motion; Amorphous materials; Coercive force; Iron; Magnetic films; Magnetic properties; Magnetostriction; Permeability; Semiconductor thin films; Sputtering; Wires;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.489795
  • Filename
    489795