Title :
Modifying the nanostructure of Co[SiO2] samples by controlled annealing
Author :
Denardin, J.C. ; Knobel, M. ; Socolovsky, L.M. ; Brandl, A.L. ; Zhang, X.X.
Author_Institution :
Inst. de Fisica Gleb Wataghin, Univ. Estadual de Campinas, Brazil
Abstract :
In situ measurements of resistance were made on cosputtered Co0.35[SiO2]0.65 granular films during annealing. The aim is to control the thermal treatment parameters and map the microstructural changes of the samples, with the respective magnetotransport response. Results of transmission electron microscopy, dc magnetization, and temperature dependence of resistivity, after annealing, show a clear evolution in the nanostructure of the samples, with increasing average Co grain sizes and wider dispersion.
Keywords :
annealing; cobalt; demagnetisation; electrical resistivity; grain size; magnetic thin films; nanocomposites; particle reinforced composites; silicon compounds; sputtered coatings; transmission electron microscopy; Co-SiO2; TEM; annealing; cosputtered granular films; demagnetization; grain size; nanostructure; resistance; resistivity; temperature dependence; Annealing; Electrical resistance measurement; Furnaces; Magnetic films; Magnetic separation; Magnetization; Metal-insulator structures; Temperature dependence; Transmission electron microscopy; Tunneling magnetoresistance;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2003.815593
