• DocumentCode
    789019
  • Title

    Millimeter-wave design considerations for power amplifiers in an SiGe process technology

  • Author

    Pfeiffer, Ullrich R. ; Valdes-Garcia, Alberto

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    54
  • Issue
    1
  • fYear
    2006
  • Firstpage
    57
  • Lastpage
    64
  • Abstract
    This paper describes a number of significant modeling considerations for SiGe heterojunction bipolar transistor power amplifiers operating at millimeter-wave frequencies. Small- and large-signal model-to-hardware correlation is presented for single transistor amplifiers, as well as for a combined dual-stage amplifier up to 65 GHz. The relevant parasitic effects are described along with the proposed modeling approach for each of them. The limits of the standard Vertical Bipolar Inter-Company device model at high-injection and their effect on the prediction of the achievable large-signal compression and power-added efficiency are also discussed.
  • Keywords
    Ge-Si alloys; bipolar MIMIC; integrated circuit modelling; millimetre wave power amplifiers; power integrated circuits; SiGe; combined dual-stage amplifier; heterojunction bipolar transistor; large-signal compression; large-signal model; millimeter-wave frequencies; model-to-hardware correlation; power amplifiers; power-added efficiency; single transistor amplifiers; small-signal model; Cutoff frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Integrated circuit interconnections; Millimeter wave measurements; Millimeter wave technology; Millimeter wave transistors; Paper technology; Power amplifiers; Silicon germanium; Millimeter wave; model-to-hardware correlation; power amplifier (PA); silicon germanium (SiGe);
  • fLanguage
    English
  • Journal_Title
    Microwave Theory and Techniques, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9480
  • Type

    jour

  • DOI
    10.1109/TMTT.2005.860898
  • Filename
    1573796