DocumentCode
789199
Title
Magnetostriction in Ar+ implanted and annealed Co/Pd multilayers
Author
Viegas, A.D.C. ; Schelp, L.F. ; Schmidt, J.E.
Author_Institution
Inst. de Fisica, Univ. Federal do Rio Grande do Sul, Porto Alegre, Brazil
Volume
31
Issue
6
fYear
1995
fDate
11/1/1995 12:00:00 AM
Firstpage
4106
Lastpage
4108
Abstract
Magnetostriction curves with (111) textured polycrystalline Co/Pd multilayers, as deposited or submitted to Ar+ ion implantation or thermal annealing, are presented and discussed. Both treatments, while promoting intermixing among Co and Pd atoms, induce an increase in the saturation magnetostriction values. The evolution of the engineering curves, however, are different due to different structural modifications promoted by the two treatments
Keywords
annealing; argon; cobalt; ion implantation; magnetic multilayers; magnetostriction; palladium; (111) textured polycrystalline Co/Pd multilayers; Ar+ ion implantation; Co-Pd:Ar; Co/P:Ar; engineering curves; magnetostriction curves; saturation magnetostriction; thermal annealing; Amorphous magnetic materials; Annealing; Ion implantation; Magnetic anisotropy; Magnetic multilayers; Magnetostriction; Multilevel systems; Perpendicular magnetic anisotropy; Saturation magnetization; Temperature;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.489876
Filename
489876
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