DocumentCode
790834
Title
Scaling the modulation bandwidth and phase efficiency of a silicon optical modulator
Author
Liu, Ansheng ; Samara-Rubio, Dean ; Liao, Ling ; Paniccia, Mario
Author_Institution
Photonics Technol. Lab., Intel Corp., Santa Clara, CA, USA
Volume
11
Issue
2
fYear
2005
Firstpage
367
Lastpage
372
Abstract
We present an optimized design and detailed simulation of an all-silicon optical modulator based on a silicon waveguide phase shifter containing a metal-oxide-semiconductor (MOS) capacitor. Based on a fully vectorial Maxwell mode solver, we analyze the modal characteristics of the silicon waveguide. We show that shrinking the waveguide size and reducing gate oxide thickness significantly enhances the phase modulation efficiency because of the optical field enhancement in the voltage induced charge layers of the MOS capacitor, which, in turn, induce refractive index modulation in silicon due to free carrier dispersion effects. We also analyze the device speed by transient semiconductor device modeling. As both optical absorption and modulation bandwidth increase with increasing doping concentration, we show that, with a nonuniform doping profile in the waveguide, balance between the device operation speed and optical loss can be realized. Our simulation suggests that a TE-polarized optical phase modulator with a bandwidth of 10 GHz and an on-chip optical loss less than 2 dB is achievable in silicon.
Keywords
MOS capacitors; doping profiles; integrated optics; light polarisation; optical design techniques; optical dispersion; optical losses; optical modulation; optical phase shifters; optical waveguides; phase modulation; refractive index; semiconductor device models; silicon; silicon-on-insulator; 10 GHz; Si; TE-polarized modulator; device operation speed; doping concentration; free carrier dispersion effects; fully vectorial Maxwell mode solver; metal-oxide-semiconductor capacitor; modulation bandwidth; modulation bandwidth scaling; nonuniform doping profile; on-chip optical loss; optical absorption; optical field enhancement; optical loss; optical phase modulator; optimized design; phase efficiency; phase modulation efficiency; phase shifter; planar lightwave circuits; reducing gate oxide thickness; refractive index modulation; silicon optical modulator; silicon waveguide; transient semiconductor device modeling; voltage induced charge layers; Bandwidth; Doping profiles; MOS capacitors; Optical devices; Optical modulation; Optical refraction; Optical variables control; Optical waveguides; Phase modulation; Silicon; Metal-oxide-semiconductor (MOS) capacitor; optical modulator; phase shifter; planar lightwave circuits; silicon photonics; silicon-on-insulator (SOI); waveguide;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2005.845618
Filename
1425473
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