DocumentCode

790978

Title

Segregated Microstructure in Sputtered Co-Cr Films by Selective Chemical Etching

Author

Takahashi, M. ; Maeda, Y. ; Asahi, M.

Author_Institution

NTT Electrical Communications Laboratories.

Volume

3

Issue

7

fYear

1988

fDate

7/1/1988 12:00:00 AM

Firstpage

515

Lastpage

516

Keywords

Chemicals; Chromium; Diffraction; Internal stresses; Ionization; Magnetic films; Microstructure; Optical films; Passivation; Sputter etching;

fLanguage

English

Journal_Title

Magnetics in Japan, IEEE Translation Journal on

Publisher

ieee

ISSN

0882-4959

Type

jour

DOI

10.1109/TJMJ.1988.4563771

Filename

4563771