Title :
Magnetic and electrical properties of NiFe-oxide mixture films
Author :
Nishioka, Koichi ; Mitsuoka, Katsuya ; Fukui, Hiroshi ; Narishige, Shinji ; Fuyama, Moriaki
Author_Institution :
Data Storage & Retrieval Syst. Div., Hitachi Ltd., Odawara, Japan
fDate :
11/1/1995 12:00:00 AM
Abstract :
In order to improve the performance of magnetoresistive heads, higher saturation flux density Bs and higher resistivity ρ are preferable for Soft Adjacent Layer (SAL). NiFe-oxide (oxide=SiO2 , Al2O3, ZrO2 and Ta2O 5) mixture films were investigated for SAL. Among these films, the NiFe-ZrO2 system is preferable because of its high Bs ρ and low coercivity. The stability of the NiFe-ZrO2 system at 250°C was also investigated, which shows that Bs and ρ change by annealing and the changes increase with ZrO2 content. MR devices of 3.2 μm width and 2.8 μm height were fabricated and transfer curves were measured. The maximum output voltage of the device in which NiFe-12mol% ZrO2 was employed was 23% larger than the calculated value for the device in which NiFe-Nb (Bs ρ=60 Tesla μΩcm) was assumed to be employed
Keywords :
coercive force; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic annealing; magnetic heads; magnetic thin film devices; magnetic thin films; magnetisation; magnetoresistance; magnetoresistive devices; magnetostriction; nickel alloys; thermal stability; zirconium compounds; 250 C; MR devices; NiFe-Al2O3; NiFe-SiO2; NiFe-Ta2O5; NiFe-ZrO2; NiFe-ZrO2 system; NiFe-oxide mixture films; SAL; anisotropy field; annealing; coercivity; magnetoresistive heads; magnetostriction; maximum output voltage; resistivity; saturation flux density; soft adjacent layer; stability; transfer curves; Annealing; Coercive force; Conductivity; Magnetic films; Magnetic flux; Magnetic heads; Magnetic properties; Magnetoresistance; Saturation magnetization; Stability;
Journal_Title :
Magnetics, IEEE Transactions on
