Title :
Co-Zn ferrite rigid disks prepared by plasma-free sputtering at low substrate temperature
Author :
Matsushita, N. ; Noma, K. ; Nakagawa, S. ; Naoe, M.
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
11/1/1995 12:00:00 AM
Abstract :
Co-Zn ferrite films deposited at substate temperature Tc below 200°C and above 400°C by using facing targets sputtering apparatus are composed of crystallites with (111) and (311) orientation, respectively. A maximum 4πMs of 4.8 kG was obtained at Ts of 250°C and then Hc was about 1.5 kOe. The linear recording density of 31 kFRPL was obtained and it is the highest value to be reported for ferrite disk media compared to previous studies using a ring type head
Keywords :
cobalt compounds; coercive force; ferrites; hard discs; magnetic hysteresis; magnetic recording; magnetic thin film devices; sputter deposition; zinc compounds; (111) orientation; (311) orientation; 90 to 500 C; Co-Zn ferrite films; Co-Zn ferrite rigid disks; Co0.51Zn0.45Fe2O4; coercive field; crystallites; facing targets sputtering; hysteresis loops; linear recording density; low substrate temperature; plasma-free sputtering; read/write characteristics; saturation magnetization; Crystallization; Disk recording; Ferrite films; Magnetic films; Magnetic heads; Plasma temperature; Protection; Saturation magnetization; Sputtering; Substrates;
Journal_Title :
Magnetics, IEEE Transactions on
